Indium-Tin Oxide transparent conductive film glass, through the ITO conductive film glass production line, in a highly purified plant environment, the use of planar magnetron technology, in the ultra-thin glass sputtering indium tin oxide conductive film coating and High temperature annealing products obtained by high-tech products.
ITO as nano-indium tin metal oxide, has a good electrical conductivity and transparency, can cut off harmful to the human body of electronic radiation, ultraviolet and far infrared. Therefore, after spraying on glass, plastic and electronic display, while enhancing the conductivity and transparency at the same time cut off the harmful electronic radiation and ultraviolet, infrared.
ITO conductive glass is based on soda-lime or silicon-boron substrate glass, the use of magnetron sputtering method coated with a layer of indium tin oxide (commonly known as ITO) film processing made. Liquid crystal display for ITO conductive glass, but also in the plating ITO layer, coated with a layer of silica barrier layer to prevent the substrate glass sodium ions to the box inside the liquid crystal diffusion. High-grade liquid crystal display dedicated ITO glass in the sputtering ITO layer before the substrate glass also polished to get more uniform display control. LCD display dedicated ITO glass substrate is generally a super float glass, all the coating surface of the glass float tin surface. Therefore, the final liquid crystal display will be along the float direction, the regular occurrence of ripples uneven situation.
When the ITO layer is sputtered, the resulting ITO layer has different properties between different targets and glass, at different temperatures and modes of motion. Some manufacturers of glass ITO layer is often the surface finish is lower, more prone to "pitting" phenomenon; some manufacturers of glass ITO layer will appear high-earthed interval, ITO layer in the etching, more prone to linear radiation type Or high resistance zone; other manufacturers of glass ITO layer will appear microcrystalline ditch.
Products are widely used in liquid crystal display (LCD), solar cells, microelectronics ITO conductive film glass, optoelectronics and a variety of optical fields. ITO conductive film of the main parameters are: surface resistance, surface resistance uniformity, light transmittance, thermal stability, heating shrinkage, heating curl and so on. Wherein the light transmittance is mainly related to the surface resistance of the ITO film and the surface resistance of the ITO film. In the case of the same substrate material, the smaller the surface resistance of the ITO film, the greater the thickness of the ITO film layer, the corresponding light transmittance will be reduced to some extent.
The following are the parameters of two different ITO conductive films:
High-impedance ITO conductive film (PET-ITO)
High-impedance ITO conductive film PET-ITO is mainly used in the field of mobile communications touch screen production.
Surface resistance: 300 ~ 500 Ω / □
Surface resistance uniformity: MD ≤ ± 3%, TD ≤ ± 6%
ITO Film Thickness: 0.188 ± 10%
Linearity (MD): ≤1.5%
Total light transmittance: ≥86%
Surface hardness (pencil hardness): ≥3H
Thermal stability: (R-R0) / R: ± 20%
Heat shrinkage: MD ≤ 1.0%, TD ≤ 0.8%
Heating curl: ≤ 10mm
Low Impedance Flexible ITO Conductive Film (PET-ITO)
It is suitable for the preparation and production of flexible electrochromic devices, flexible thin film solar cells and flexible EL light emitting devices.
Film thickness: 0.175 ± 10 mm
Width: 406/360 ± 2 mm
Curl: ≤ 10 mm
Transmittance: ≥ 80%
Surface resistance: 90 ± 15 Ω / □
Surface resistance uniformity: <7%
Heat shrinkage: MD ≤ 1.3, TD ≤ 1.0
High temperature: 80oC, 120hr ≤ 1.3
Low temperature: -40oC, 120hr ≤1.3
Thermal cycling: -30oC-80oC ≤1.3
Heat / humidity: 60oC, 90% RH, 120hr ≤ 1.3
ITO conductive layer characteristics
The main component of the ITO film is indium tin oxide. In the case of a thickness of only a few thousand angstroms, indium oxide transmission rate, tin oxide conductivity, liquid crystal display used ITO glass is a high transmittance of the conductive glass. Because ITO has a strong water absorption, it will absorb the water and carbon dioxide in the air and produce chemical reactions and deterioration, commonly known as "mildew", so in the storage to moisture.
ITO layer in the active positive ion solution is easy to produce ion exchange reaction, the formation of other conductive and poor transmittance of the reaction material, so in the process, try to avoid long time in the active price of the original ion solution. ITO layer by a lot of small grain composition, grain in the heating process will become small fission, thereby increasing the grain boundary, the electronic breakthrough grain boundary will lose a certain amount of energy, so ITO conductive glass ITO layer at 600 degrees The following will increase with the temperature, resistance also increased.
ITO conductive glass classification
ITO conductive glass by resistance points, divided into high resistance glass (resistance in the 150 ~ 500 ohms), ordinary glass (resistance in the 60 ~ 150 ohms), low resistance glass (resistance less than 60 ohms). High resistance glass is generally used for electrostatic protection, touch screen production; ordinary glass is generally used for TN liquid crystal display and electronic anti-jamming; low resistance glass is generally used for STN liquid crystal display and transparent circuit board. ITO conductive glass by size, there are 14 "x14", 14 "x16", 20 "x24" and other specifications; by thickness, 2.0mm, 1.1mm, 0.7mm, 0.55mm, 0.4mm, 0.3mm and other specifications, Thickness of 0.5mm below the main for STN liquid crystal display products. ITO conductive glass according to flatness points, divided into polished glass and ordinary glass.
The main parameters that affect the performance of ITO glass
Length, width, thickness and tolerance (± 0.20)
Warpage (thickness 0.7mm above ≤ 0.10%, thickness 0.55mm below ≤0.15%)
(0.20mm ≤ width ≤ 1.00mm, radius of curvature ≤ 50mm) chamfering (float direction 2.0mmX5.0mm; the remaining 1.5mmx1.5mm) SIO2 block (0.05mm ≤ width ≤0.40mm) Layer thickness (350 Å ± 50 Å, 550nm transmittance ≥ 90%) ITO layer optical, electrical, etching performance (etching solution: 600C 37% HCL: H2O: 67% HNO3 = 50: 50: 3)
Alkali for immersion in 600C, the concentration of 10% sodium hydroxide solution for 5 minutes, ITO layer block resistance change value of not more than 10%. Acid resistance for immersion 250C, 6% hydrochloric acid solution for 5 minutes, ITO layer block resistance change value of not more than 10%. The resistance of the ITO layer is less than 10% after 5 minutes in the cleaning solution formulated with 250C, acetone, absolute ethanol or 100 parts deionized water plus 3 min EC101. Adhesion: the tape attached to the surface of the film and quickly tear off, the film without damage; or even tear three times, ITO layer box resistance change value of not more than 10%. Thermal stability: In the 3000C air, after heating for 30 minutes, ITO conductive film box resistance value should not be greater than the original box resistance of 300%.
Crack: Not allowed. Adhesive: including dust particles, glass broken and other protrusions, TN type ITO conductive glass coating surface does not allow unresectable height of more than 0.1mm of adhesion; STN ITO conductive glass coating surface is not allowed to be removed Adhesives with a height of more than 0.05mm. Contamination: Do not be insoluble in water or general cleaning agent can not remove the stain. Collapse length: length X width ≤ 2.0mmx1.0mm; depth does not exceed 50% of the thickness of the glass substrate; total length ≤ 5% of the total length. Scratches
Vitreous point defects: including bubbles, inclusions, surface pits, color points and so on. The diameter of the dotted defect is defined as: d = (defect length + defect width) / 2.
Vitreous linear defects (width W): including glass bars, optical deformation. Membrane point defects: SIO2 barrier layer and ITO conductive layer of the dot-like defects, including pinholes, holes, particles, etc., the diameter of the dotted defect is defined as: d = (defect length + defect width) / 2.